Plasma deposition of catalytic thin films: Experiments, applications, molecular modeling

Simulation of Fabrication toward High Quality Thin Films for Robotic Applications by Ionized Cluster Beam Deposition

The most commonly used method for the production of thin films is based on deposition of atoms or molecules onto a solid surface. One of the suitable method is to produce high quality metallic, semiconductor and organic thin film is Ionized cluster beam deposition (ICBD), which are used in electronic, robotic, optical, optoelectronic devices. Many important factors such as cluster size, cluster...

Ultraviolet laser deposition of graphene thin films without catalytic layers

Deposition of Thin Films by Plasma Polymerization for Biomedical Application

This study represents a review of deposition of polyethylene oxide-like thin films by means of low pressure plasma discharges. Current state-of-the-art is discussed and novel approach based on plasma assisted vacuum thermal degradation is introduced together with the first experimental results reached using this technique.

Spotlight: Catalytic applications of molecular machines

Morteza Torabi was born in 1995 in Hamedan, Iran. He received his B.Sc. in Applied Chemistry (2017) and M.Sc. in Organic Chemistry (2019) from Bu-Ali Sina University under the supervision of Professor Mohammad Ali Zolfigol. He is currently working towards his Ph.D. under the supervision of Professor Mohammad Ali Zolfigol at Bu-Ali Sina University. His research interest is the design, synthesis ...

Atomic/molecular layer deposition of hybrid inorganic-organic thin films

Aalto University, P.O. Box 11000, FI-00076 Aalto www.aalto.fi Author Pia Sundberg Name of the doctoral dissertation Atomic/molecular layer deposition of hybrid inorganic-organic thin films Publisher School of Chemical Technology Unit Department of Chemistry Series Aalto University publication series DOCTORAL DISSERTATIONS 201/2014 Field of research Inorganic Chemistry Manuscript submitted 11 Se...